• Title of article

    The quadratic finite element thermal analysis of silicon irradiated by a pulsed KrF excimer laser

  • Author/Authors

    Masaki Nakamiya، نويسنده , , Toshiyuki and Ikegami، نويسنده , , Tomoaki and Ebihara، نويسنده , , Kenji، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    5
  • From page
    409
  • To page
    413
  • Abstract
    The melting and solidification process of crystalline silicon (c-Si) sample flashed by a pulsed KrF excimer laser is studied numerically. The dynamics of pulsed nanosecond laser melting process is simulated by the solution of the one-dimensional heat conduction equation. The quadratic finite element method (FEM) is applied to solve the equation. This method is based upon a higher order FEM with a smaller error and allowing faster convergence to the exact solution. The surface temperatures obtained by the quadratic FEM are in good agreement with the exact solutions. In addition to this, the temperature-dependent optical and thermal properties of the irradiated c-Si have been taken into account and the calculated results are compared with the experimental data published.
  • Journal title
    Computational Materials Science
  • Serial Year
    2000
  • Journal title
    Computational Materials Science
  • Record number

    1678559