Title of article
The quadratic finite element thermal analysis of silicon irradiated by a pulsed KrF excimer laser
Author/Authors
Masaki Nakamiya، نويسنده , , Toshiyuki and Ikegami، نويسنده , , Tomoaki and Ebihara، نويسنده , , Kenji، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
5
From page
409
To page
413
Abstract
The melting and solidification process of crystalline silicon (c-Si) sample flashed by a pulsed KrF excimer laser is studied numerically. The dynamics of pulsed nanosecond laser melting process is simulated by the solution of the one-dimensional heat conduction equation. The quadratic finite element method (FEM) is applied to solve the equation. This method is based upon a higher order FEM with a smaller error and allowing faster convergence to the exact solution. The surface temperatures obtained by the quadratic FEM are in good agreement with the exact solutions. In addition to this, the temperature-dependent optical and thermal properties of the irradiated c-Si have been taken into account and the calculated results are compared with the experimental data published.
Journal title
Computational Materials Science
Serial Year
2000
Journal title
Computational Materials Science
Record number
1678559
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