• Title of article

    Diffusion behavior of sulfur in the p(1×1) phase of a S/Ni(111) system

  • Author/Authors

    H. Tsukawaki، نويسنده , , S. and Hatano، نويسنده , , Y. and Hashizume، نويسنده , , K. and Sugisaki، نويسنده , , M.، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2000
  • Pages
    8
  • From page
    63
  • To page
    70
  • Abstract
    The surface phase diagram of S/Ni(111) in the temperature range from room temperature to 900 K has been established by reflection high-energy electron diffraction observations in consultation with previously reported data. The temperature dependence of surface diffusion coefficient of sulfur in a p(1×1) phase was measured with micro probe Auger electron microscopy from 513 to 597 K. The diffusion coefficient in the p(1×1) phase in the coverage region from 0.05 to 0.10 ML is expressed as: D (cm2 s−1)=2×103 exp[−1.1±0.1(eV)/kBT].
  • Keywords
    nickel , surface diffusion , surface structure , morphology , Roughness , and topography , Sulphur
  • Journal title
    Surface Science
  • Serial Year
    2000
  • Journal title
    Surface Science
  • Record number

    1678903