Multiscale simulation of cluster growth and deposition processes by hybrid model based on direct simulation Monte Carlo method

A cluster growth and deposition model based on hybrid modeling is introduced to examine the experimental conditions of the cluster growth process in vacuum chamber and deposition process on substrate. This hybrid model is a simulation method including physical length and time scale characteristics of macro and microscale. We simulated the behavior of the cluster during the flight path by direct simulation Monte Carlo (DSMC) method and the deposition behavior on the substrate by a simple MC model. Several size distributions of the clusters and various morphologies of deposited film were obtained, and the relationship between macroscopic and microscopic physical phenomena during deposition process was examined.