Title of article
Ellipsometric comparison of the native oxides of silicon and semiconducting iron disilicide (β-FeSi2)
Author/Authors
Rebien، نويسنده , , M. and Henrion، نويسنده , , W. and Angermann، نويسنده , , H. and Rِseler، نويسنده , , A.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2000
Pages
8
From page
143
To page
150
Abstract
The optical properties of the native oxide of semiconducting iron disilicide (β-FeSi2) were examined by spectroscopic ellipsometry and reflectance measurements. The room temperature oxide grown directly after removal from the preparation chamber, as well as after etching in NH4F solution, was investigated. In all cases the spectral influence in the optical spectra can be modelled by SiO2. The oxidation kinetics of β-FeSi2 were found to be very similar to those of silicon. There were no signs of iron oxides or segregation of Fe or Si. The results suggest that the native oxide of β-FeSi2 is SiOx (x≤2).
Keywords
ellipsometry , Etching , Oxidation , Reflection spectroscopy , Silicides , Silicon oxides , Surface roughening
Journal title
Surface Science
Serial Year
2000
Journal title
Surface Science
Record number
1679336
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