Title of article :
Surface X-ray diffraction study on the initial oxidation of NiAl(100)
Author/Authors :
Stierle، نويسنده , , A. and Formoso، نويسنده , , V. and Comin، نويسنده , , F. and Franchy، نويسنده , , R.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2000
Abstract :
The oxidation behavior of NiAl(100) surfaces was studied using surface X-ray diffraction. After oxidation of the preferentially Ni-terminated surface at 950°C for 500 s at 2×10−6 mbar O2, the formation of epitaxial Al2O3 in a (2×1) superstructure was observed. Along the (2×1) superstructure reciprocal lattice rods, two different modulation periods could be detected. The shorter period arises from the growth of 2 nm high θ-Al2O3 oxide islands in monoclinic structure, the longer period from a 0.76 nm thick Al2O3 layer. This layer exhibits a θ-Al2O3-like structure with strongly modified Al ion positions at the surface and at the metal/oxide interface.
Keywords :
Metal–insulator interfaces , Single crystal surfaces , Diffraction , Alloys , Aluminium oxide , Insulating films , and reflection , Oxidation , Low index single crystal surfaces , Growth , X-Ray scattering
Journal title :
Surface Science
Journal title :
Surface Science