Title of article :
Diffusion behavior of sulfur in p(1×1) phase of S/Ni(1 0 0) system
Author/Authors :
H. Tsukawaki، نويسنده , , S. and Hatano، نويسنده , , Y. and Hashizume، نويسنده , , K. and Sugisaki، نويسنده , , M.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2001
Pages :
6
From page :
115
To page :
120
Abstract :
The surface phase diagram of S/Ni(1 0 0) in a temperature region from room temperature to 1100 K has been examined by reflection high energy electron diffraction observation, and the temperature and sulfur coverage regions of the p(1×1) phase have been determined. The temperature dependence of surface diffusion coefficient of sulfur in the p(1×1) phase has been measured with micro-probe Auger electron spectroscopy in a temperature region from 820 to 900 K and in a sulfur coverage region from 0.03 to 0.07 ML. The obtained diffusion coefficient in the p(1×1) phase is expressed as D (cm2/s)=1.0×10−2 exp (−1.0±0.1 (eV)/kBT).
Keywords :
nickel , surface diffusion , surface structure , morphology , Roughness , and topography , Sulphur
Journal title :
Surface Science
Serial Year :
2001
Journal title :
Surface Science
Record number :
1680052
Link To Document :
بازگشت