• Title of article

    Monte Carlo simulation of transport process of the sputtered species in the facing target sputtering technique

  • Author/Authors

    Abhilash، نويسنده , , V. and Balu، نويسنده , , R. and Balaji، نويسنده , , S. and Senthil Nathan، نويسنده , , S. and Mohan، نويسنده , , S.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2004
  • Pages
    7
  • From page
    523
  • To page
    529
  • Abstract
    In facing target sputtering (FTS) technique two targets facing each other are sputtered simultaneously and the particles are collected in the off axis position. When these two targets constitute two different materials having different sputtering yields, the deposited films show a gradation in composition along the axis parallel to the targets. The process parameters involved, increase the complexity of understanding the composition profile of the deposited films. Here an attempt has been made to simulate the transport behavior of the sputtered species, which leads to the theoretical realization of the variation in composition. The simulation has been performed for SmCo system using the Monte Carlo approach based on the empirical formula proposed by Sigmund and Thompson. The theoretical results have been compared with the experimental results obtained and are explained in detail.
  • Keywords
    Monte Carlo simulation , transport process , Facing target sputtering
  • Journal title
    Computational Materials Science
  • Serial Year
    2004
  • Journal title
    Computational Materials Science
  • Record number

    1680545