Title of article
Nano-scale anodic oxidation on a Si(1 1 1) surface terminated by bilayer-GaSe
Author/Authors
Ueno، نويسنده , , K and Okada، نويسنده , , R and Saiki، نويسنده , , K and Koma، نويسنده , , A، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2002
Pages
6
From page
27
To page
32
Abstract
Nano-scale oxide patterns were fabricated on a bilayer-GaSe terminated Si(1 1 1) surface using an atomic force microscope (AFM) in air. The Si(1 1 1) surface regularly terminated by bilayer-GaSe is very stable in air, although it can be oxidized through the electrochemical reaction when positive sample bias voltage is applied between the surface and a conductive cantilever tip of AFM. It has been revealed that higher sample bias voltage, slower tip velocity and/or higher ambient humidity produce wider and/or thicker oxide protrusions. Then, nano-scale oxide patterns as narrow as 50 nm have been successfully drawn on the terminated surface by adjusting these experimental conditions. These oxide lines can be etched away by dipping the sample into aqueous HF solution, and nano-scale grooves can be fabricated on the bilayer-GaSe terminated Si(1 1 1) surface.
Keywords
Gallium selenide , Etching , Silicon , atomic force microscopy , Silicon oxides , Oxidation
Journal title
Surface Science
Serial Year
2002
Journal title
Surface Science
Record number
1681239
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