Selective vapor deposition polymerization on actively patterned surfaces

Microcontact-printing (μCP) method was used to functionalize silicon surfaces with aminosilane forming a pattern. We utilized the surface reactivity on the μCP pattern for vapor deposition polymerization to form patterned polymer films. On the μCP patterned substrates, two sets of monomers were evaporated in vacuum, and the polymerization was controlled by the substrate temperature and the evaporation sequences. By alternative pulsed vapor deposition of two monomers (terephthaloylchloride and 4,4′-diaminodiphenyl-ether) using pulse valves, we produced polyamide films on the patterned substrate at elevated temperature. We found that the aminosilanized areas showed increased thickness and flatter surface structure. One set of monomers did not grow preferentially on the functionalized surface and the resulting films did not exhibit structural or thickness differences. Our results indicate that the reactivity and the retention time of the monomers on the surface caused the different film growth on the activated and inert surfaces.