Title of article
Electronic structure of alkali halide–metal interface: LiCl(0 0 1)/Cu(0 0 1)
Author/Authors
Kiguchi، نويسنده , , M and Inoue، نويسنده , , H and Saiki، نويسنده , , K and Sasaki، نويسنده , , T and Iwasawa، نويسنده , , Y and Koma، نويسنده , , A، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2003
Pages
6
From page
84
To page
89
Abstract
Electronic structure of the heteroepitaxial LiCl thin film grown on Cu(0 0 1) was studied using electron energy loss spectroscopy (EELS) and ultraviolet photoelectron spectroscopy (UPS), as a model system of the insulator/metal interface. The EELS results did not show any change in the band gap of the LiCl film, though the Anderson’s prediction indicated that the band gap of an insulator decreased at the insulator/metal interface. The change in the band gap of the LiCl film is discussed by considering Madelung potential and many body effects. The UPS results, on the other hand, showed an upward shift of the Cl 3p with an increasing film thickness.
Keywords
Metal–insulator interfaces , Photoelectron spectroscopy , Electron energy loss spectroscopy (EELS) , Alkali Halides , Copper
Journal title
Surface Science
Serial Year
2003
Journal title
Surface Science
Record number
1681822
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