Title of article
Thin PTCDA films on Si(0 0 1): 2. Electronic structure
Author/Authors
Gustafsson، نويسنده , , J.B. and Moons، نويسنده , , E. and Widstrand، نويسنده , , S.M. and Gurnett، نويسنده , , M. and Johansson، نويسنده , , L.S.O.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2004
Pages
11
From page
32
To page
42
Abstract
We have studied the thin film formation and the electronic structure of the organic molecular semiconductor 3,4,9,10 perylene tetracarboxylic dianhydride (PTCDA), on clean and on hydrogen-passivated Si(0 0 1) surfaces. The studies were made by means of high resolution X-ray photoelectron spectroscopy (HRXPS), angle-resolved photoelectron spectroscopy (ARPES), near edge X-ray absorption fine structure (NEXAFS) and low energy electron diffraction (LEED). On the H passivated surface the changes in the electronic structure of the substrate and the molecules with increasing film thickness are very small. The molecular orbitals show a dispersive behavior, indicating that the PTCDA layers are ordered. On the reactive clean surface the anhydride groups of the molecule interact with the substrate as indicated by changes in the core level binding energies. This results in a much lower ordering in the film compared to PTCDA on a passivated silicon surface. There is no sign of decomposition of the molecule because of the more reactive substrate.
Keywords
Silicon , Near edge extended X-ray absorption fine structure (NEXAFS) , Semiconducting films , X-ray photoelectron spectroscopy , Electron emission
Journal title
Surface Science
Serial Year
2004
Journal title
Surface Science
Record number
1682400
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