• Title of article

    Surface oxidation of liquid Sn

  • Author/Authors

    Grigoriev، نويسنده , , Alexei and Shpyrko، نويسنده , , Oleg and Steimer، نويسنده , , Christoph and Pershan، نويسنده , , Peter S. and Ocko، نويسنده , , Benjamin M. and Deutsch، نويسنده , , Moshe and Lin، نويسنده , , Binhua and Meron، نويسنده , , Mati and Graber، نويسنده , , Timothy and Gebhardt، نويسنده , , Jeffrey، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2005
  • Pages
    10
  • From page
    223
  • To page
    232
  • Abstract
    We report the results of an X-ray scattering study that reveals oxidation kinetics and formation of a previously unreported crystalline phase of SnO at the liquid–vapour interface of Sn. Our experiments reveal that the pure liquid Sn surface does not react with molecular oxygen below an activation pressure of ∼5.0 × 10−6 Torr. Above that pressure a rough solid Sn oxide grows over the liquid metal surface. Once the activation pressure has been exceeded the oxidation proceeds at pressures below the oxidation pressure threshold. The observed diffraction pattern associated with the surface oxidation does not match any of the known Sn oxide phases. The data have an explicit signature of the face-centred cubic structure, however it requires lattice parameters that are about 9% smaller than those reported for cubic structures of high-pressure phases of Sn oxides.
  • Keywords
    X-Ray scattering , and reflection , Diffraction , Oxidation , Surface chemical reaction , surface structure , Roughness , morphology , Tin oxides , and topography , Polycrystalline thin films , TIN , liquid surfaces
  • Journal title
    Surface Science
  • Serial Year
    2005
  • Journal title
    Surface Science
  • Record number

    1682592