Title of article :
Vanadium on TiO2(1 1 0): adsorption site and sub-surface migration
Author/Authors :
Agnoli، نويسنده , , S. and Castellarin-Cudia، نويسنده , , C. and Sambi، نويسنده , , M. and Surnev، نويسنده , , David S. L. Ramsey، نويسنده , , M.G. and Granozzi، نويسنده , , G. and Netzer، نويسنده , , F.P.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2003
Pages :
10
From page :
117
To page :
126
Abstract :
The initial stages of the growth of vanadium overlayers on TiO2(1 1 0) at room temperature have been investigated with scanning tunneling microscopy. At very low coverages both individual vanadium adatoms and small vanadium clusters have been imaged with good resolution. The V adatoms adsorb preferentially on the so-called “upper threefold hollow” sites, as revealed by atomically resolved STM images: they are thus bonded to two bridging oxygen atoms and one threefold coordinated basal oxygen atom. At higher coverages the vanadium adlayers grow in form of poorly ordered three-dimensional islands. The number of V clusters at low coverages decreases by gentle annealing or with time even at room temperature. This kinetic effect has been interpreted in terms of sub-surface migration of V adatoms.
Keywords :
vanadium , Titanium oxide , Scanning tunneling microscopy , Adsorption kinetics , growth
Journal title :
Surface Science
Serial Year :
2003
Journal title :
Surface Science
Record number :
1684013
Link To Document :
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