Title of article :
Tailoring surface electronic states via strain to control adsorption: O/Cu/Ru(0 0 0 1)
Author/Authors :
Otero، نويسنده , , R. and Calleja، نويسنده , , F. and Garc??a-Su?rez، نويسنده , , V.M. and Hinarejos، نويسنده , , J.J. and de la Figuera، نويسنده , , J. and Ferrer، نويسنده , , J. and V?zquez de Parga، نويسنده , , A.L. and Miranda، نويسنده , , R.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2004
Abstract :
A possible relationship between population of the surface electronic state and chemical reactivity for Cu layers on Ru(0 0 0 1) is revealed by tunneling spectroscopy and microscopy. The surface state shifts down in energy with increasing thickness. Ab initio calculations indicate that the energy shift can be assigned to the decreasing tensile strain of the deposited film. The reactivity of the surface towards oxygen correlates with the population of this state, reaching a maximum at Cu thicknesses where the surface state is empty. These data provides an indication of the effect of strain on the reactivity of metal surfaces.
Keywords :
etc.) , Surface states , Density functional calculations , Copper , Scanning tunneling microscopy , Scanning tunneling spectroscopies , Chemisorption , sticking , Surface electronic phenomena (work function , Surface potential
Journal title :
Surface Science
Journal title :
Surface Science
