Title of article
Quantum well dimension and energy level determination in Pb/Si(1 1 1)-7×7
Author/Authors
Yeh، نويسنده , , V. and Hupalo، نويسنده , , M. E. Conrad، نويسنده , , E.H. and Tringides، نويسنده , , M.C.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2004
Pages
8
From page
23
To page
30
Abstract
The comparison between measured vs calculated electronic energy levels in quantum well states (QWS) depends on the dimension of the potential well confining the electrons. The dimensions of the well can be determined with structural probes (high resolution LEED and STM) while the electronic structure can be obtained with angle resolved photoemission and STM spectroscopy. For heteroepitaxial growth the dimension of the well depends on the thickness of the wetting layer between the island and the substrate. For the Pb/Si(1 1 1)-7 × 7 system using SPA-LEED and STM, we have measured the thickness of the layer underneath the islands and the substrate to be 1 ML at all temperatures. For Pb films grown on top of the Si(1 1 1)-7 × 7 at low temperatures T<110 K we have determined the height distribution at the metal/vacuum interface with STM to test how the quantitative analysis of QWS found in photoemission experiments is affected.
Keywords
quantum effects , Quantum wells , Electron–solid diffraction , growth , Low energy electron diffraction (LEED) , Scanning tunneling microscopy , Silicon , Lead , Wetting
Journal title
Surface Science
Serial Year
2004
Journal title
Surface Science
Record number
1684292
Link To Document