Title of article :
Methyl-terminated Si(1 1 1) surface as the ultra thin protection layer to fabricate position-controlled alkyl SAMs by using atomic force microscope anodic oxidation
Author/Authors :
Okada، نويسنده , , R and Miyadera، نويسنده , , T and Shimada، نويسنده , , T and Koma، نويسنده , , A and Ueno، نويسنده , , K and Saiki، نويسنده , , K، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2004
Pages :
7
From page :
46
To page :
52
Abstract :
Methyl-terminated Si(1 1 1) (Me–Si(1 1 1)) and bilayer-GaSe terminated Si (BGS) surfaces were investigated to explore their usefulness as the protection layer in the fabrication process of nanometer-scale self-assembled monolayers (SAMs). BGS was not stable in the reagent involved in the alkyl SAM formation, whereas Me–Si(1 1 1) was suitable for the protection layer. Anodization using atomic force microscope (AFM) and following HF and hexadecene treatments were performed to form nano-scale alkyl SAM lines on the Me–Si(1 1 1) surface. It was found from AFM observation and frictional force measurement that only the patterned areas were selectively covered with hexadecyl SAMs.
Keywords :
Auger electron spectroscopy , Reflection high-energy electron diffraction (RHEED) , atomic force microscopy , SELF-ASSEMBLY , Surface chemical reaction , Silicon , Etching
Journal title :
Surface Science
Serial Year :
2004
Journal title :
Surface Science
Record number :
1684347
Link To Document :
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