• Title of article

    An option for the surface science on Cu chalcopyrites: the selenium capping and decapping process

  • Author/Authors

    Hunger، نويسنده , , Ralf and Schulmeyer، نويسنده , , Thomas and Klein، نويسنده , , Andreas and Jaegermann، نويسنده , , Wolfram and Sakurai، نويسنده , , Keiichiro and Yamada، نويسنده , , Akimasa and Fons، نويسنده , , Paul and Matsubara، نويسنده , , Koji and Niki، نويسنده , , Shigeru، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2004
  • Pages
    6
  • From page
    263
  • To page
    268
  • Abstract
    A selenium capping and decapping process for the protection of CuInSe2 surfaces during storage in air was investigated. The quality and cleanness of CuInSe2(0 0 1) surfaces restored in UHV by thermal evaporation of the covering protective Se cap was assessed. For the study, MBE-grown heteroepitaxial CuInSe2/GaAs(0 0 1) films were employed. capping and decapping process was monitored by reflection high-energy electron diffraction. The Se cap layer is amorphous and, after its reevaporation, the initial diffraction pattern of CuInSe2(0 0 1) is restored. The decapping process and the quality of decapped CuInSe2(0 0 1) surfaces were investigated by means of photoelectron spectroscopy using synchrotron radiation with excitation energies of 1050 and 95 eV. For a decapping temperature of 390 °C, an O 1s contamination signal as small as the detection limit was found. Photoelectron spectra taken with the highest surface-sensitivity (hν=95 eV) yield well-resolved valence band emissions confirming the low contamination level and high quality of the decapped surfaces. The investigations show that the Se capping and decapping process is an efficient means for the conservation and restoration of clean and well-defined Cu chalcopyrite surfaces in UHV.
  • Keywords
    surface structure , morphology , Roughness , and topography , Inorganic compounds , Low index single crystal surfaces , Chalcogens , Reflection high-energy electron diffraction (RHEED) , Synchrotron radiation photoelectron spectroscopy
  • Journal title
    Surface Science
  • Serial Year
    2004
  • Journal title
    Surface Science
  • Record number

    1684668