• Title of article

    Structure analysis of the Ta(0 0 1)1 × 1–H surface

  • Author/Authors

    Yamazaki، نويسنده , , H and Sakamoto، نويسنده , , K and Fujii، نويسنده , , A and Kamisawa، نويسنده , , T، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2004
  • Pages
    7
  • From page
    41
  • To page
    47
  • Abstract
    Surface structure of H-adsorbed Ta(0 0 1) surface for saturation coverage at room temperature has been studied by low energy electron diffraction (LEED), a symmetrized automated tensor LEED program and high-resolution electron energy loss spectroscopy (HREELS). The optimized structure is that H atoms are adsorbed at a threefold hollow site taking four symmetrically equivalent sites in the unit cell of the unreconstructed Ta(0 0 1) surface. The layer separation between the H atom and the topmost Ta atom layer is 0.16 Å and atomic distance between the H atom and the first layer Ta atom is 1.94 Å and that between the H atom and the second layer Ta atom is 1.92 Å, which agree well with the sum of hard sphere radii of H (0.5–0.6 Å) and Ta atom (1.43 Å).
  • Keywords
    hydrogen atom , tantalum , Chemisorption , Low energy electron diffraction (LEED) , surface structure , morphology , and topography , Roughness
  • Journal title
    Surface Science
  • Serial Year
    2004
  • Journal title
    Surface Science
  • Record number

    1684794