• Title of article

    Diffusion and stability of small vacancy clusters on Cu(1 0 0)––a simulation study

  • Author/Authors

    Basham، نويسنده , , M. and Mulheran، نويسنده , , P.A. and Montalenti، نويسنده , , F.، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2004
  • Pages
    11
  • From page
    289
  • To page
    299
  • Abstract
    The stability and mobility of small vacancy clusters on the Cu(1 0 0) surface has been investigated using temperature-accelerated dynamics simulation. The rate-limiting step for cluster dissociation is found to involve two-atom shearing, a mechanism previously discovered in the diffusion of small adatom islands. The tetramer vacancy cluster is found to be very stable and to have low diffusivity, suggesting that it may have an important role in the morphological evolution of growing surfaces. The filling of the tetramer vacancy cluster by single adatoms is also investigated, and the similarities to adatom accommodation at downward step-edges are highlighted.
  • Keywords
    Copper , computer simulations , Clusters
  • Journal title
    Surface Science
  • Serial Year
    2004
  • Journal title
    Surface Science
  • Record number

    1684860