Title of article
Diffusion and stability of small vacancy clusters on Cu(1 0 0)––a simulation study
Author/Authors
Basham، نويسنده , , M. and Mulheran، نويسنده , , P.A. and Montalenti، نويسنده , , F.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2004
Pages
11
From page
289
To page
299
Abstract
The stability and mobility of small vacancy clusters on the Cu(1 0 0) surface has been investigated using temperature-accelerated dynamics simulation. The rate-limiting step for cluster dissociation is found to involve two-atom shearing, a mechanism previously discovered in the diffusion of small adatom islands. The tetramer vacancy cluster is found to be very stable and to have low diffusivity, suggesting that it may have an important role in the morphological evolution of growing surfaces. The filling of the tetramer vacancy cluster by single adatoms is also investigated, and the similarities to adatom accommodation at downward step-edges are highlighted.
Keywords
Copper , computer simulations , Clusters
Journal title
Surface Science
Serial Year
2004
Journal title
Surface Science
Record number
1684860
Link To Document