Title of article
Synthesis, characterization and surface reactivity of tungsten carbide (WC) PVD films
Author/Authors
Zellner، نويسنده , , Michael B. and Chen، نويسنده , , Jingguang G.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2004
Pages
10
From page
89
To page
98
Abstract
Phase-pure tungsten carbide (WC) and Pt-modified WC thin films have been synthesized using the physical vapor deposition (PVD) technique. The physical and chemical properties of the PVD films have been studied using high-resolution electron energy loss spectroscopy (HREELS), X-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD), and near edge X-ray adsorption fine structure (NEXAFS). TPD and HREELS have been utilized to investigate the reactivity of the WC and Pt-modified WC films toward the reaction with cyclohexene. The addition of Pt on the WC surface enhances the selective dehydrogenation pathway to produce gas phase benzene. The results reported here illustrate the feasibility of utilizing TPD and HREELS to investigate the surface chemistry of well-characterized PVD films.
Keywords
Tungsten , thermal desorption , Carbides , Electron energy loss spectroscopy (EELS) , Near edge extended X-ray absorption fine structure (NEXAFS)
Journal title
Surface Science
Serial Year
2004
Journal title
Surface Science
Record number
1684873
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