Title of article
Submonolayer growth in the presence of defect sites
Author/Authors
Vardavas، نويسنده , , R. and Ratsch، نويسنده , , C. and Caflisch، نويسنده , , R.E.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2004
Pages
8
From page
185
To page
192
Abstract
Submonolayer epitaxy in the presence of defect sites on the substrate is studied by means of a level-set method. Here, island nucleations occur by the creation of dimers and defect-monomer pairs. We present results for the scaled island size distribution (ISD) for growth with different densities for both random and regularly positioned defects. The dynamics show that for large D/F and defect density, all islands are nucleated at the defect sites in the very early stages of growth. We use scaling ideas to show that a gamma distribution can suitably describe the ISD.
Keywords
epitaxy , GROWTH , Surface defects
Journal title
Surface Science
Serial Year
2004
Journal title
Surface Science
Record number
1684882
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