Title of article
Preparation of stoichiometric GaN(0 0 0 1)-1 × 1 studied with spectromicroscopy
Author/Authors
Widstrand، نويسنده , , S.M. and Magnusson، نويسنده , , K.O and Larsson، نويسنده , , M.I. and Johansson، نويسنده , , L.S.O. and Gustafsson، نويسنده , , J.B. and Moons، نويسنده , , E. and Yeom، نويسنده , , H.W. and Miki، نويسنده , , H. and Oshima، نويسنده , , M.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2004
Pages
9
From page
409
To page
417
Abstract
Using annealing in an ammonia atmosphere in combination with Ga adsorption and desorption, polar surfaces of ex situ grown GaN(0 0 0 1) epilayers can be prepared towards clean and stoichiometric conditions. This combination of surface treatments also improves the surface crystalline order and chemical homogeneity, as observed in photoelectron spectra, in low energy electron diffraction (LEED) patterns, and of the coefficient of variation (Cvar) of the Ga 3d intensity in the spectromicroscopy images. The lateral resolution limit of the spectromicroscopy images is 2 μm. The surface improvements during NH3 annealing show saturation effects. The best surface quality in terms of the crystalline order and chemical homogeneity was found after annealing at 800 °C in NH3, followed by Ga adsorption and finally desorption by annealing in a NH3 atmosphere.
Keywords
Gallium nitride , Photoelectron spectroscopy , Low energy electron diffraction (LEED) , Ammonia , Semiconducting films
Journal title
Surface Science
Serial Year
2004
Journal title
Surface Science
Record number
1684950
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