• Title of article

    Scanning tunneling microscopy/spectroscopy observation of intrinsic hydrogenated amorphous silicon surface under light irradiation

  • Author/Authors

    Arima، نويسنده , , Kenta and Kakiuchi، نويسنده , , Hiroaki and Ikeda، نويسنده , , Manabu and Endo، نويسنده , , Katsuyoshi and Morita، نويسنده , , Mizuho and Mori، نويسنده , , Yuzo، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2004
  • Pages
    10
  • From page
    449
  • To page
    458
  • Abstract
    Continuous visible light irradiation is used to observe intrinsic hydrogenated amorphous silicon (a-Si:H) surfaces by scanning tunneling microscopy (STM) and scanning tunneling spectroscopy (STS). A deposited a-Si:H surface is wet-cleaned in order to terminate the a-Si:H surface with H atoms. A current-sample bias (I–V) curve shows a rectifying behavior in the dark, and the tunneling current increases dramatically only under the reverse-bias condition with light irradiation. This is attributed to the photoexcited minority carriers that lead to the appearance of a higher voltage across the vacuum than that in the dark. Experiments with both p-type and n-type substrates justify the suggested model. High tunneling current under irradiation enables us to obtain highly resolved STM images. Current imaging tunneling spectroscopy observations show that the detected tunneling current in the reverse direction is increased over the entire surface with irradiation, and the increment of the tunneling current is different at each surface site.
  • Keywords
    Roughness , and topography , Silicon , Amorphous surfaces , Scanning tunneling spectroscopies , X-ray photoelectron spectroscopy , Scanning tunneling microscopy , Surface photovoltage , surface structure , morphology
  • Journal title
    Surface Science
  • Serial Year
    2004
  • Journal title
    Surface Science
  • Record number

    1684955