Title of article
Scanning tunneling microscopy/spectroscopy observation of intrinsic hydrogenated amorphous silicon surface under light irradiation
Author/Authors
Arima، نويسنده , , Kenta and Kakiuchi، نويسنده , , Hiroaki and Ikeda، نويسنده , , Manabu and Endo، نويسنده , , Katsuyoshi and Morita، نويسنده , , Mizuho and Mori، نويسنده , , Yuzo، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2004
Pages
10
From page
449
To page
458
Abstract
Continuous visible light irradiation is used to observe intrinsic hydrogenated amorphous silicon (a-Si:H) surfaces by scanning tunneling microscopy (STM) and scanning tunneling spectroscopy (STS). A deposited a-Si:H surface is wet-cleaned in order to terminate the a-Si:H surface with H atoms. A current-sample bias (I–V) curve shows a rectifying behavior in the dark, and the tunneling current increases dramatically only under the reverse-bias condition with light irradiation. This is attributed to the photoexcited minority carriers that lead to the appearance of a higher voltage across the vacuum than that in the dark. Experiments with both p-type and n-type substrates justify the suggested model. High tunneling current under irradiation enables us to obtain highly resolved STM images. Current imaging tunneling spectroscopy observations show that the detected tunneling current in the reverse direction is increased over the entire surface with irradiation, and the increment of the tunneling current is different at each surface site.
Keywords
Roughness , and topography , Silicon , Amorphous surfaces , Scanning tunneling spectroscopies , X-ray photoelectron spectroscopy , Scanning tunneling microscopy , Surface photovoltage , surface structure , morphology
Journal title
Surface Science
Serial Year
2004
Journal title
Surface Science
Record number
1684955
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