Title of article
Thermal behaviour of ultra-thin Co overlayers on rutile TiO2(1 0 0) surface
Author/Authors
Chai، نويسنده , , J.W. and Pan، نويسنده , , J.S. and Wang، نويسنده , , S.J. and Huan، نويسنده , , C.H.A. and Lau، نويسنده , , G.S. and Zheng، نويسنده , , Y.B. and Xu، نويسنده , , S.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2005
Pages
10
From page
32
To page
41
Abstract
Thermal behaviour of ultra-thin Co overlayers on rutile TiO2(1 0 0) surface has been studied by in situ X-ray photoelectron spectroscopy (XPS). Metal Co overlayers of about 30 إ have been deposited at room temperature on rutile TiO2(1 0 0) surfaces, followed by annealing to different temperatures. It was found that the interfacial reaction between the Co overlayers and TiO2(1 0 0) surfaces occurred upon annealing to temperatures above 400 °C. Above these temperatures, all metallic Co atoms were oxidized into the Co2+ state, while some Ti4+ were reduced to Ti3+ with increasing temperature. Ex situ surface morphology studies by atomic force microscopy (AFM) suggest that thermal annealing resulted in the agglomeration of the metal film deposited at room temperature and the formation of islands. Annealing to higher temperature led to the dissociation of the small Co islands due to Co oxidation while the larger islands remained and grew continuously. Two types of island nanostructures were observed by ex situ high-resolution transmission electron microscopy (HRTEM).
Keywords
Cobalt , Interfacial reaction , Titanium dioxide , Co diffusion , surface morphology , X-ray photoelectron spectroscopy , atomic force microscopy , Transmission electron microscopy
Journal title
Surface Science
Serial Year
2005
Journal title
Surface Science
Record number
1685277
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