• Title of article

    Thermal behaviour of ultra-thin Co overlayers on rutile TiO2(1 0 0) surface

  • Author/Authors

    Chai، نويسنده , , J.W. and Pan، نويسنده , , J.S. and Wang، نويسنده , , S.J. and Huan، نويسنده , , C.H.A. and Lau، نويسنده , , G.S. and Zheng، نويسنده , , Y.B. and Xu، نويسنده , , S.، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2005
  • Pages
    10
  • From page
    32
  • To page
    41
  • Abstract
    Thermal behaviour of ultra-thin Co overlayers on rutile TiO2(1 0 0) surface has been studied by in situ X-ray photoelectron spectroscopy (XPS). Metal Co overlayers of about 30 إ have been deposited at room temperature on rutile TiO2(1 0 0) surfaces, followed by annealing to different temperatures. It was found that the interfacial reaction between the Co overlayers and TiO2(1 0 0) surfaces occurred upon annealing to temperatures above 400 °C. Above these temperatures, all metallic Co atoms were oxidized into the Co2+ state, while some Ti4+ were reduced to Ti3+ with increasing temperature. Ex situ surface morphology studies by atomic force microscopy (AFM) suggest that thermal annealing resulted in the agglomeration of the metal film deposited at room temperature and the formation of islands. Annealing to higher temperature led to the dissociation of the small Co islands due to Co oxidation while the larger islands remained and grew continuously. Two types of island nanostructures were observed by ex situ high-resolution transmission electron microscopy (HRTEM).
  • Keywords
    Cobalt , Interfacial reaction , Titanium dioxide , Co diffusion , surface morphology , X-ray photoelectron spectroscopy , atomic force microscopy , Transmission electron microscopy
  • Journal title
    Surface Science
  • Serial Year
    2005
  • Journal title
    Surface Science
  • Record number

    1685277