Title of article :
Strain-relieving ridge structure in a wetting layer on the W(1 1 0) surface
Author/Authors :
Kim، نويسنده , , T.-H. and Seo، نويسنده , , J. and Choi، نويسنده , , J. and Choi، نويسنده , , B.-Y. and Song، نويسنده , , Y.J. and Kuk، نويسنده , , Y. and Kahng، نويسنده , , S.-J.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2005
Pages :
5
From page :
30
To page :
34
Abstract :
The growth behavior and atomic structure of the Ag wetting layer grown on the W(1 1 0) surface, was studied with scanning tunneling microscopy. Deposited Ag atoms preferentially adsorb at the step edges and reveal a step-flow growth behavior at room temperature. In the Ag wetting layer, a periodic bright ridge structure was observed along the [ 3 ¯ 3 7 ] and [ 3 ¯ 3 7 ¯ ] directions. The atomic registry of the ridge structure is proposed on the basis of atomically resolved images.
Keywords :
Nanostructures , surface structure , epitaxy , Scanning tunneling microscopy
Journal title :
Surface Science
Serial Year :
2005
Journal title :
Surface Science
Record number :
1685423
Link To Document :
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