Title of article :
High energy excitations in ion-induced electron emission from AlF3
Author/Authors :
Ruano، نويسنده , , G. and Vidal-Sallé، نويسنده , , R.A. and Ferrَn، نويسنده , , J. and Baragiola، نويسنده , , R.A.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2011
Abstract :
Measurements of electron emission spectra from surfaces of aluminum fluoride impacted by keV noble gas ions show a high-energy structure, peaking around 7 eV that increases in intensity with ion energy. The shape of this structure, identified by Factor Analysis, is independent of the nature and the energy of the impinging ions. We discuss one electron, two electron and plasmon excitation mechanisms and conclude that the high-energy structure results from the autoionization of F− 2p4nl n′l′ excited by electron promotion in close atomic collisions.
Keywords :
Ion induced electron emission , Autoionization , Factor Analysis , Insulating films
Journal title :
Surface Science
Journal title :
Surface Science