• Title of article

    Vacancy-mediated diffusion of Co atoms embedded in Cu(001)

  • Author/Authors

    van Gastel، نويسنده , , Raoul and Van Moere، نويسنده , , Ronald and Zandvliet، نويسنده , , Harold J.W. and Poelsema، نويسنده , , Bene، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2011
  • Pages
    6
  • From page
    1956
  • To page
    1961
  • Abstract
    The diffusion of Co atoms in the Cu(001) surface has been studied using Scanning Tunneling Microscopy (STM). Like other impurities in the Cu(001) surface, the diffusion of Co is mediated by single surface vacancies. STM images reveal that diffusion of the embedded atoms takes place through multi-atom jumps separated by long time intervals, which is characteristic for this type of diffusion. The jump length and frequency are measured to establish the nature of the interaction between surface vacancies and the embedded Co atoms and to extract the relevant formation and diffusion energies.
  • Keywords
    Scanning tunneling microscopy (STM) , Cobalt , Copper , surface structure , roughness and topography , morphology , diffusion
  • Journal title
    Surface Science
  • Serial Year
    2011
  • Journal title
    Surface Science
  • Record number

    1686211