Ga induced 2D superstructural phase diagram on trenched Si(5 5 12) surface

The high index Si(5 5 12) surface offers morphological trenches, which can be interesting for epitaxial growth. In this study, the evolution of Ga adsorption at a very low flux rate of 0.03 ML/min on high index trenched Si(5 5 12) − 2 × 1 reconstructed surface at various substrate temperatures ranging from room temperature (RT) to 600 °C has been investigated using in-situ AES, LEED and EELS. The Auger uptake curves, which plot the Ga(LMM)/Si(LVV) Auger intensity ratio with Ga adsorption time, show that Ga grows in layer plus islands mode for substrate temperatures in the RT to 350 °C range, while it grows in Volmer–Weber (3D islands) for higher substrate temperatures (> 350 °C). We also arrive at a complete 2D superstructural phase diagram for Ga/Si(5 5 12) interfacial system that shows the pathways to attain the different superstructural phases. The formation of Ga nanowires as (2 2 5), (3 3 7) phase and Ga 3D islands in the (1 1 2) − 6 × 1, (1 1 2) − 6 × 2 phases and other Ga induced superstructural phases like (7 7 17) + 2x(1 1 3), (2 2 5) + (3 3 7), 1 × 1 has been carefully followed. The electronic structures of each of the observed phases have been probed by EELS and each of them is shown to have characteristic features.