Title of article
Formation and stability of the Cu(110)+c(2×2)-Si surface alloy studied by high resolution XPS
Author/Authors
Rojas، نويسنده , , C. and Palomares، نويسنده , , F.J. and L?pez، نويسنده , , M.F. and Goldoni، نويسنده , , A. and Paolucci، نويسنده , , G. and Mart??n-Gago، نويسنده , , J.A.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2000
Pages
5
From page
778
To page
782
Abstract
High-resolution synchrotron radiation photoemission has been used to investigate the formation of the Cu(110)+c(2×2)-Si surface alloy. The complex spectra of the Si 2p core-level are analyzed as multiple component spectra for different Si coverages and annealing temperatures of the surface alloy. The results show that c(2×2) islands are formed from the very beginning of the growth and that Si has a high diffusion length on Cu. The thermal stability of the surface alloy has been studied by measuring real-time photoemission spectra at different temperatures. The surface alloy is stable up to 180°C. Above this temperature disruption of the surface alloy and clustering of the Si atoms can be observed.
Keywords
Roughness , and topography , Synchrotron radiation photoelectron spectroscopy , Copper , GROWTH , Metal–semiconductor interfaces , surface structure , morphology , Silicon
Journal title
Surface Science
Serial Year
2000
Journal title
Surface Science
Record number
1688378
Link To Document