Title of article :
Surface structure and electron density dependence of scattered Ne+ ion fractions from the Si(1 0 0)-(2×1) surface
Author/Authors :
I. Vaquila، نويسنده , , I. and Lui، نويسنده , , K.M. and Rabalais، نويسنده , , J.W. and Wolfgang، نويسنده , , J. and Nordlander، نويسنده , , P.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2001
Pages :
10
From page :
255
To page :
264
Abstract :
The magnitudes and azimuthal anisotropies of 4 keV Ne+ scattered ion fractions from the Si(1 0 0)-(2×1) two-domain surface have been measured by means of time-of-flight scattering and recoiling spectrometry. The absolute values of these ion fractions as well as their dependence on surface structure and electron density have been determined. By investigating the trajectories of the scattered Ne+, a clear correlation is demonstrated between these experimentally observed surviving ion fractions of Ne+ and the fraction of ions that scatters from the topmost layer of the surface. This is interpreted in terms of a model in which the neutralization probability of Ne+ is proportional to the local substrate electronic charge density.
Keywords :
morphology , Roughness , and topography , Silicon , Semi-empirical models and model calculations , surface structure , Ion–solid interactions
Journal title :
Surface Science
Serial Year :
2001
Journal title :
Surface Science
Record number :
1688945
Link To Document :
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