Title of article :
The lateral variation of solid state reactions at surfaces studied by means of photoemission electron microscopy: formation of titanium silicides
Author/Authors :
Schmidt، نويسنده , , O and Fecher، نويسنده , , G.H، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2001
Pages :
6
From page :
335
To page :
340
Abstract :
The alloying and oxygen reduction at titanium silicon interfaces were studied by means of photoemission microscopy. The microscopic chemical composition of the sample surface was characterised by means of imaging X-ray absorption. The silicide formation was studied at clean and oxidised silicon substrates both covered with micron-sized titanium patterns.
Keywords :
Electron microscopy , X-ray absorption spectroscopy , Silicides , Titanium
Journal title :
Surface Science
Serial Year :
2001
Journal title :
Surface Science
Record number :
1689994
Link To Document :
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