Title of article
EELS study of Rh particle growth on ZrO2 substrate with different deposition conditions
Author/Authors
Lykhach، نويسنده , , Y. and Sotiropoulou، نويسنده , , D. and Thiam، نويسنده , , M.M. and Pe?i?ka، نويسنده , , J. and Nehasil، نويسنده , , V.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2001
Pages
8
From page
789
To page
796
Abstract
Electron energy loss spectroscopy (EELS) and Auger electron spectroscopy (AES) have been used to monitor the formation of Rh films on ZrO2(1 0 0) single crystalline substrates. Rhodium was evaporated step by step at various substrate temperatures. The surface morphology of the deposited material influences EELS spectra, so that the relative metal coverage of the substrate can be calculated. The EELS and AES results were compared and the conclusions concerning the deposit morphology were verified by means of transmission electron microscopy.
Keywords
Clusters , Electron energy loss spectroscopy (EELS) , Auger electron spectroscopy , zirconium , GROWTH , Rhodium
Journal title
Surface Science
Serial Year
2001
Journal title
Surface Science
Record number
1690161
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