Title of article
Plasma-enhanced chemical vapor deposition of nitrides on fluidized particles
Author/Authors
Sanchez، نويسنده , , I and Flamant، نويسنده , , G and Gauthier، نويسنده , , D and Flamand، نويسنده , , R and Badie، نويسنده , , J.M and Mazza، نويسنده , , G، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
7
From page
134
To page
140
Abstract
A new plasma jet fluidized bed reactor working at atmospheric pressure is presented. The plasma arc is created inside the bed of particles in order to improve the reactivity between excited gaseous species and the particles to be coated. Metal chlorides, nitrogen and hydrogen were used as precursors of deposited layers. TiN, Si3N4 and SiOx coatings were deposited on silica and corundum particles by this plasma-assisted CVD process. Optical emission spectroscopy and electron microanalysis characterized the plasma and the layer composition, respectively.
Keywords
fluidized bed , Gliding arc , Plasma Diagnostics , CVD , Coating , nitrides
Journal title
Powder Technology
Serial Year
2001
Journal title
Powder Technology
Record number
1691761
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