Title of article
Measurement of the sputter yield after mild ion erosion of a pristine Cu(001) surface
Author/Authors
Stoian، نويسنده , , Georgiana and van Gastel، نويسنده , , Raoul and Wormeester، نويسنده , , Herbert and Poelsema، نويسنده , , Bene، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2012
Pages
5
From page
1618
To page
1622
Abstract
Using the STM technique we have determined the sputter yield on a pristine Cu(001) surface after mild (fluence less than 0.044 ions per surface atom) bombardment of the pristine surface with 800 eV Ar+ions at normal incidence. The experiments have been performed at substrate temperatures ranging from 200 to 350 K. Making use of the positional correlation of adatoms and surface vacancies, at 200 K and 325 K, we concluded that about 1/3 of the surface adatoms originate from interstitials arriving at the surface and they give a direct indication of the buried bulk vacancies. A careful analysis of the different areas for surface vacancies and adatom then allowed a quantitative evaluation of the sputter yield at 1.2 Cu atoms per 800 eV Ar+ ion.
Keywords
Ion beam induced defects , Sputter yield , STM
Journal title
Surface Science
Serial Year
2012
Journal title
Surface Science
Record number
1692425
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