Title of article :
Adsorption of Co on Si(1 0 0) surface
Author/Authors :
Wei، نويسنده , , Shuyi and Yang، نويسنده , , Zongxian and Dai، نويسنده , , Xianqi and Zhang، نويسنده , , Kaiming، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2002
Abstract :
The adsorption of one monolayer Co atoms on an ideal Si(1 0 0) surface is studied by using the self-consistent tight binding linear muffin-tin orbital method. Energies of adsorption systems of a Co atom on different sites are calculated. It is found that the adsorbed Co atoms are more favorable on C site (fourfold site) than on any other sites on Si(1 0 0) surface and a Co, Si mixed layer might exist at Co/Si(1 0 0) interface. The charge transfer and the layer projected density of states are also studied.
Keywords :
Cobalt , Silicon , Low index single crystal surfaces , Chemisorption , Metallic films
Journal title :
Surface Science
Journal title :
Surface Science