Title of article
Electrochemical properties of plasma-modified Si surfaces
Author/Authors
Gabouze، نويسنده , , N.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2002
Pages
5
From page
695
To page
699
Abstract
Electrochemical properties and applications of CHx films were investigated. Silicon single crystal electrodes were coated with hydrocarbon groups (CHx) deposited by plasma of methane. The results presented suggest that the effect of the methane–plasma treatment is more a physical inhibition than a chemical effect and can be used as a potential tool for ultra-low thickness masking and patterning.
Keywords
morphology , Roughness , Silicon , and topography , Coatings , Electrochemical methods , surface structure
Journal title
Surface Science
Serial Year
2002
Journal title
Surface Science
Record number
1694535
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