Title of article :
Adsorbed states of 1,1,1-trifluoro-2-propanol on Si(1 0 0)
Author/Authors :
Nagao، نويسنده , , Masashi and Nagaoka، نويسنده , , Shinichi S. Tanaka، نويسنده , , Shin-ichiro and Mukai، نويسنده , , Kozo and Yamashita، نويسنده , , Yoshiyuki and Yoshinobu، نويسنده , , Jun، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2003
Abstract :
The adsorbed states of 1,1,1-trifluoro-2-propanol (TFIP) molecule on Si(1 0 0) c(4 × 2) have been investigated by high resolution electron energy loss spectroscopy. TFIP is dissociatively adsorbed on Si(1 0 0) as CF3CH(O–Si)CH3 and H–Si at 100 K. These species are stable up to 300 K. At 400 K, CF bonds start to be dissociated. At 800 K, all adsorbed species are decomposed into SiH, SiF, SiF2 and residual carbon species. At 1050 K, the silicon carbide is formed.
Keywords :
Silicon , alkanes , alcohols , Chemisorption , Electron energy loss spectroscopy (EELS)
Journal title :
Surface Science
Journal title :
Surface Science