Title of article :
Electronic states and chemical reactivity of Si(1 0 0)c(4 × 2) surface at low temperature studied by high resolution Si 2p core level photoelectron spectroscopy
Author/Authors :
Machida، نويسنده , , S. and Nagao، نويسنده , , M. and Yamamoto، نويسنده , , S. and Kakefuda، نويسنده , , Y. and Mukai، نويسنده , , K. and Yamashita، نويسنده , , Y. and Yoshinobu، نويسنده , , J.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2003
Pages :
5
From page :
716
To page :
720
Abstract :
We have investigated the electronic states of clean and BF3 adsorbed Si(1 0 0) surfaces at low temperature by means of high resolution Si 2p photoelectron spectroscopy. The peak intensities of upper atom and lower atom of the asymmetric dimer in Si 2p spectra do not change even at 30 K compared with those at higher temperature up to 300 K, indicating that the dimer is asymmetric in the ground state. In order to investigate chemical reactivity of asymmetric dimer on Si(1 0 0), a typical Lewis acid molecule BF3 is adsorbed on Si(1 0 0). We have found that BF3 molecules are dissociated into BF2 and F on Si(1 0 0) and dissociated species (BF2 and F) are adsorbed predominantly on the up dimer atoms of the asymmetric dimers.
Keywords :
Silicon , Photoelectron spectroscopy , Halides
Journal title :
Surface Science
Serial Year :
2003
Journal title :
Surface Science
Record number :
1695963
Link To Document :
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