• Title of article

    Difference between staying and diffusing Si adsorbates on the Si(1 1 1)7 × 7 surface

  • Author/Authors

    Uchida، نويسنده , , Hironaga and Watanabe، نويسنده , , Satoshi and Kuramochi، نويسنده , , Hiromi and Kishida، نويسنده , , Masaru and Kim، نويسنده , , Jooyoung and Nishimura، نويسنده , , Kazuhiro and Inoue، نويسنده , , Mitsuteru and Aono، نويسنده , , Masakazu، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2003
  • Pages
    9
  • From page
    737
  • To page
    745
  • Abstract
    We investigate adsorbed Si atoms on the Si(1 1 1)7 × 7 surface deposited from an scanning tunneling microscope (STM) tip. In our experiments at room temperature, two types of Si adsorbates on the surface are observed, “staying” Si adsorbate that remains at the same position, and “diffusing” Si one that is detected as a noise-like feature on an STM image. Molecular orbital calculations are performed to distinguish difference of these Si adsorbates. Stable positions, transition states, diffusion barriers and electron density iso-surfaces for extra Si atoms on Si cluster models are obtained. From these results, we propose new assignments to these Si adsorbates: the staying and diffusing Si adsorbates correspond to two Si atoms and a single Si atom, respectively.
  • Keywords
    surface diffusion , Scanning tunneling microscopy , Silicon , Chemisorption , Ab initio quantum chemical methods and calculations , Semi-empirical models and model calculations
  • Journal title
    Surface Science
  • Serial Year
    2003
  • Journal title
    Surface Science
  • Record number

    1695985