XPS study of the FCuPc/SiO2 interface

We have studied the interaction between the hexadecafluoro-copper-phthalocyanine molecules and the SiO2 surface by means of the X-ray photoemission spectroscopy. The measurements have been done at high electron emission angle in order to enhance the surface sensitivity. Molecular films with different thicknesses have been deposited by thermal evaporation on clean SiO2 surface. When a sub-monolayer molecular film is deposited the formation of a very thin clean silicon layer at the sample surface, because of the effects of the fluorine atoms, is observed. This interaction also determines the breaking of the first molecules at the substrate surface and the growth of a rich-carbon thin film. The following molecules form a bulk-like film.