• Title of article

    UV-irradiation induced modification of PDMS films investigated by XPS and spectroscopic ellipsometry

  • Author/Authors

    Schnyder، نويسنده , , Bernhard and Lippert، نويسنده , , Thomas and Kِtz، نويسنده , , Rüdiger and Wokaun، نويسنده , , Alexander and Graubner، نويسنده , , Vera-Maria and Nuyken، نويسنده , , Oskar، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2003
  • Pages
    5
  • From page
    1067
  • To page
    1071
  • Abstract
    UV-irradiation (172 nm) induced changes of PDMS surfaces were investigated with X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry (SE). Both methods indicate the modification of the PDMS to a silica-like surface (SiO2). These conclusions could be drawn from the elemental composition determined by XPS and the binding energy shifts in the XPS spectra of the Si 2p and O 1s levels. Similarly the refractive index n determined with ellipsometry reaches a value close to the one of SiO2. Additionally, ellipsometry allows to monitor the decrease of the original film thickness with increasing UV-irradiation time.
  • Keywords
    ellipsometry , X-ray photoelectron spectroscopy , Amorphous surfaces , Insulating films , ozone , photochemistry , Coatings , Silicon oxides
  • Journal title
    Surface Science
  • Serial Year
    2003
  • Journal title
    Surface Science
  • Record number

    1696196