Title of article
Elastic origin of the O/Cu(1 1 0) self-ordering evidenced by GIXD
Author/Authors
Prévot، نويسنده , , G and Croset، نويسنده , , B and Girard، نويسنده , , Y and Coati، نويسنده , , A and Garreau، نويسنده , , Y and Hohage، نويسنده , , M and Sun، نويسنده , , L.D and Zeppenfeld، نويسنده , , P، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2004
Pages
15
From page
52
To page
66
Abstract
We have studied by grazing incidence X-ray diffraction the self-ordering of the Cu–CuO stripe pattern. By comparing the experimental results to molecular dynamics simulations and anisotropic linear elastic calculations, we have been able to determine the atomic relaxations within the Cu substrate. The results show the importance of the crystalline anisotropy in the relaxation field. These relaxations are due to the surface stress difference Δσ between oxygen-covered and bare Cu(1 1 0) regions. For the different oxygen coverages studied, we have always found Δσ=1.0±0.1 N m−1. This surface stress difference is shown to be the origin of the self-ordering.
Keywords
Surface stress , Oxygen , Low index single crystal surfaces , X-Ray scattering , Diffraction , and reflection , Copper
Journal title
Surface Science
Serial Year
2004
Journal title
Surface Science
Record number
1696576
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