Title of article :
The structures of physisorbed and chemisorbed formic acid on Si(1 1 1)-7 × 7
Author/Authors :
Huang، نويسنده , , Jing Yan and Huang، نويسنده , , Hai Gou and Lin، نويسنده , , Katherine Y. and Liu، نويسنده , , Qi Ping and Sun، نويسنده , , Yue Ming and Xu، نويسنده , , Guo Qin، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2004
Abstract :
The reaction of formic acid on Si(1 1 1)-7 × 7 was investigated using X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS) and high-resolution electron energy loss spectroscopy (HREELS). The hydroxyl and carbonyl O 1s core levels of chemisorbed formic acid display chemical shifts of 2.4 and 0.2 eV respectively, compared with those of physisorbed molecules. The HREELS spectra of chemisorbed formic acid show the absence of stretching and bending modes of the O–H bond, the appearance of Si–H (2089 cm−1) and the Si–O (680 cm−1) stretching modes and the retained stretching mode of CO at 1703 cm−1. Our results clearly suggest that formic acid dissociates to form monodentate formate species and H-atom on the adatom–rest atom pair of Si(1 1 1)-7 × 7.
Keywords :
Silicon , Photoelectron spectroscopy , Electron energy loss spectroscopy (EELS) , Carboxylic acid , Chemisorption , physical adsorption
Journal title :
Surface Science
Journal title :
Surface Science