Title of article :
Effect of atomic diagonal motion on cluster diffusion coefficient and its scaling behavior
Author/Authors :
Wang، نويسنده , , Xiaoping and Xie، نويسنده , , Feng and Shi، نويسنده , , Qinwei and Zhao، نويسنده , , Texiu، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2004
Abstract :
The effect of atomic diagonal motion on the cluster diffusion and its size dependence is simulated by kinetic Monte Carlo method. The diffusion coefficient D(N) of a cluster with size N satisfies a power law D(N)∝N−α, where the scaling exponent α decreases with the increase of additive diagonal motion barrier Ed. When Ed is very small, the cluster diffusion is dominantly controlled by periphery diffusion mechanism and α is found to be about 1.5. On the contrary, when Ed is very large, the cluster diffusion is mainly controlled by the correlation evaporation and condensation (CEC) mechanism and α approaches 1.0. Furthermore, a threshold Edt∼0.4E0 (E0 is the diffusion barrier for a free adatom), corresponding to the transition of different dominant mechanisms for the cluster diffusion, is found existing in the relationship between D and Ed. When Ed<Edt, the cluster diffusion is mainly controlled by the diagonal motion of the atom, and D decreases drastically with increasing Ed. When Ed>Edt, the CEC mechanism is more important, and D is nearly independent of Ed. Additionally, the temperature dependent of D is found to be D∼exp(−EakBT) and the active energy Ea is found to ∼1.42E0.
Keywords :
Diffusion and migration , Monte Carlo simulations , Metallic surfaces , Clusters
Journal title :
Surface Science
Journal title :
Surface Science