Impact of interface relaxation on the nanoscale corrugation in Pb/Si(1 1 1) islands

The nanoscale hexagonal pattern observed in scanning tunneling microscopy (STM) for 3-layer and 4-layer Pb islands on Si(1 1 1) is studied theoretically. We found that besides thickness the atomic rearrangement at the Pb/Si interface plays an important role in determining the STM patterns. Electronic structures of the Pb film on Si(1 1 1) obtained from fully relaxed and unrelaxed Pb films are qualitatively different. Simulated STM images for Pb films with different stacking also show that the corrugation patterns are sensitive to the buried Pb–Si interfacial structure.