Title of article :
Phosphorus and hydrogen atoms on the (0 0 1) surface of silicon: A comparative scanning tunnelling microscopy study of surface species with a single dangling bond
Author/Authors :
Reusch، نويسنده , , T.C.G. and Curson، نويسنده , , N.J. and Schofield، نويسنده , , S.R. and Hallam، نويسنده , , T. and Simmons، نويسنده , , M.Y.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2006
Pages :
7
From page :
318
To page :
324
Abstract :
We present a comparative scanning tunnelling microscopy (STM) study of two features on the Si(0 0 1) surface with a single dangling bond. One feature is the Si–P heterodimer—a single surface phosphorus atom substituted for one Si atom of a Si–Si dimer. The other feature is the Si–Si–H hemihydride—a single hydrogen atom adsorbed to one Si atom of a Si–Si dimer. Previous STM studies of both surface species have reported a nearly identical appearance in STM which has hampered an experimental distinction between them to date. Using voltage-dependent STM we are able to distinguish and identify both heterodimer and hemihydride on the Si(0 0 1) surface. This work is particularly relevant for the fabrication of atomic-scale Si:P devices by STM lithography on the hydrogen terminated Si(0 0 1):H surface, where it is important to monitor the distribution of single P dopants in the surface. Based on the experimental identification, we study the lateral P diffusion out of nanoscale reservoirs prepared by STM lithography.
Keywords :
Scanning tunnelling microscopy , surface diffusion , Silicon , Hydrogen , Phosphorus , Nanopatterning
Journal title :
Surface Science
Serial Year :
2006
Journal title :
Surface Science
Record number :
1697567
Link To Document :
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