Passivation and activation: How do monovalent atoms modify the reactivity of silicon surfaces?: A perspective on the article, “The mechanism of amine formation on Si(1 0 0) activated with chlorine atoms”, by C.C. Finstad, A.D. Thorsness, and A.J

Hamers، نويسنده , , Robert J.، نويسنده ,

هفته نامه با شماره پیاپی سال 2006

2

3361

3362

Amine formation , Chlorine atoms , Silicon surfaces

Surface Science

2006

Surface Science

1698833