Title of article
Passivation and activation: How do monovalent atoms modify the reactivity of silicon surfaces?: A perspective on the article, “The mechanism of amine formation on Si(1 0 0) activated with chlorine atoms”, by C.C. Finstad, A.D. Thorsness, and A.J
Author/Authors
Hamers، نويسنده , , Robert J.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2006
Pages
2
From page
3361
To page
3362
Keywords
Amine formation , Chlorine atoms , Silicon surfaces
Journal title
Surface Science
Serial Year
2006
Journal title
Surface Science
Record number
1698833
Link To Document