Title of article :
Interdiffusion process in the InSe/Pt interface studied by angle-resolved photoemission
Author/Authors :
Sلnchez-Royo، نويسنده , , J.F. and Segura، نويسنده , , A. and Pellicer-Porres، نويسنده , , J. and Chevy، نويسنده , , A.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2006
Pages :
5
From page :
3734
To page :
3738
Abstract :
The electronic structure of the InSe/Pt interface has been studied by angle-resolved and X-ray photoemission measurements. From these results, it has been found that Pt incorporates into the InSe lattice at initial stages of Pt deposition, acting as a surface acceptor-like which tends to turn the interface into intrinsic. Beyond certain Pt submonolayer coverage, the band-bending process appears to be controlled by localized states appearing close to the Fermi level. The appearance of these states has been attributed to a reaction-like mechanism between diffused Pt and InSe atoms. For this interface, it has been found that a final electronic barrier of ∼1.2 eV is formed, close to that expected for an abrupt InSe/Pt Schottky barrier. Nevertheless, the atomic structure of the interface is far from that expected for an ideal Schottky interface.
Keywords :
Reactivity , Layered compounds , Schottky interfaces , Metal-semiconductor interfaces , X-ray photoemission
Journal title :
Surface Science
Serial Year :
2006
Journal title :
Surface Science
Record number :
1699206
Link To Document :
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