Title of article
Bias dependence of STM profiles around the quantum point contact
Author/Authors
Nagaoka، نويسنده , , K. and Yaginuma، نويسنده , , S. and Nagao، نويسنده , , T. and Nakayama، نويسنده , , T.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2006
Pages
4
From page
4319
To page
4322
Abstract
We report atomic-scale quantum point contacts (QPCs) formed parallel to the substrate surface. The QPCs are formed in domain boundary of a multidomain Bi{0 1 2} film on a Si(1 1 1)-β√3 × √3-Bi substrate, thus direct observation of the QPCs with a scanning tunneling microscope (STM) is possible. Bias dependence of STM images indicates that a localized electronic state exists near the Fermi level around the QPC. Presumably, the localized state originates from the electronic confinement in a cylindrical potential well along the conduction channel through the QPC.
Keywords
Reflection high-energy electron diffraction (RHEED) , Bismuth (Bi) , Scanning tunneling microscopy (STM) , Quantum confinement , Silicon (Si) , Thin film structure , Nanostructures
Journal title
Surface Science
Serial Year
2006
Journal title
Surface Science
Record number
1699628
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