• Title of article

    Bias dependence of STM profiles around the quantum point contact

  • Author/Authors

    Nagaoka، نويسنده , , K. and Yaginuma، نويسنده , , S. and Nagao، نويسنده , , T. and Nakayama، نويسنده , , T.، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2006
  • Pages
    4
  • From page
    4319
  • To page
    4322
  • Abstract
    We report atomic-scale quantum point contacts (QPCs) formed parallel to the substrate surface. The QPCs are formed in domain boundary of a multidomain Bi{0 1 2} film on a Si(1 1 1)-β√3 × √3-Bi substrate, thus direct observation of the QPCs with a scanning tunneling microscope (STM) is possible. Bias dependence of STM images indicates that a localized electronic state exists near the Fermi level around the QPC. Presumably, the localized state originates from the electronic confinement in a cylindrical potential well along the conduction channel through the QPC.
  • Keywords
    Reflection high-energy electron diffraction (RHEED) , Bismuth (Bi) , Scanning tunneling microscopy (STM) , Quantum confinement , Silicon (Si) , Thin film structure , Nanostructures
  • Journal title
    Surface Science
  • Serial Year
    2006
  • Journal title
    Surface Science
  • Record number

    1699628