Title of article :
Hydroxylated α-Al2O3 (0 0 0 1) surfaces and metal/α-Al2O3 (0 0 0 1) interfaces
Author/Authors :
Fu، نويسنده , , Qiang and Wagner، نويسنده , , Thomas and Rühle، نويسنده , , Manfred، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2006
Pages :
8
From page :
4870
To page :
4877
Abstract :
X-ray photoelectron spectroscopy was applied to study the hydroxylation of α-Al2O3 (0 0 0 1) surfaces and the stability of surface OH groups. The evolution of interfacial chemistry of the α-Al2O3 (0 0 0 1) surfaces and metal/α-Al2O3 (0 0 0 1) interfaces are well illustrated via modifications of the surface O1s spectra. Clean hydroxylated surfaces are obtained through water- and oxygen plasma treatment at room temperature. The surface OH groups of the hydroxylated surface are very sensitive to electron beam illumination, Ar+ sputtering, UHV heating, and adsorption of reactive metals. The transformation of a hydroxylated surface to an Al-terminated surface occurs by high temperature annealing or Al deposition.
Keywords :
Metal-oxide interfaces , X-ray photoelectron spectroscopy , Surface chemical reactions , Molecular Beam Epitaxy , Metallic films , Aluminum oxide
Journal title :
Surface Science
Serial Year :
2006
Journal title :
Surface Science
Record number :
1699837
Link To Document :
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